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Showing results 1 to 14 of 14

DateTitleAuthor(s)Full text
2010Theoretical Investigation on the Effect of Protonation on the Absorption and Emission Spectra of Two Amine-Group-Bearing, Red "Push-Pull" Emitters, 4-Dimethylamino-4 '-nitrostilbene and 4-(dicyanomethylene)-2-methyl-6-p-(dimethylamino) styryl-4H-pyran, by DFT and TDDFT CalculationsPetsalakis, I. D.; Georgiadou, D. G.; Vasilopoulou, M.; Pistolis, G.; Dimotikali, D.; Argitis, P.; Theodorakopoulos, G.
2007Nano-scale spatial control over surface morphology of biocompatible fluoropolymers at 157 nmSarantopoulou, Evangelia; Kollia, Zoe; Cefalas, Alciviadis Constantinos; Douvas, A. M.; Chatzichristidi, M.; Argitis, P.; Kobe, S.
2007Polymer self-assembled nano-structures and surface relief gratings induced with laser at 157 nmSarantopoulou, Evangelia; Kollia, Zoe; Cefalas, Alciviadis Constantinos; Douvas, A. M.; Chatzichristidi, M.; Argitis, P.; Kobe, S.
2005157 nm laser ablation of polymeric layers for fabrication of biomolecule microarraysDouvas, A. M.; Petrou, P. S.; Kakabakos, S. E.; Misiakos, K.; Argitis, P.; Sarantopoulou, Evangelia; Kollia, Zoe; Cefalas, Alciviadis Constantinos
2005Self assembled structures on fluoro-polymers induced with laser light at 157 nmKollia, Zoe; Sarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos; Kobe, S.; Argitis, P.; Missiakos, K.
2003Nanostructured imaging of biological specimens in vivo with laser plasma X-ray contact microscopyCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Kollia, Zoe; Argitis, P.; Tegou, E.; Ford, T. W.; Stead, A. D.; Danson, C. N.; Neely, D.; Kobe, S.
2003The challenges of 157 nm nanolithography: surface morphology of silicon-based copolymersSarantopoulou, Evangelia; Kollia, Zoe; Kocevar, K.; Musevic, I.; Kobe, S.; Drazic, G.; Gogolides, E.; Argitis, P.; Cefalas, Alciviadis Constantinos
2002Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithographyBellas, V.; Tegou, E.; Raptis, I.; Gogolides, E.; Argitis, P.; Iatrou, H.; Hadjichristidis, N.; Sarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos
2002He-2 60-90 nm photon source for investigating photodissociation dynamics of potential X-UV resistsCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Argitis, P.; Gogolides, E.
2001Photoresist materials for 157-nm photolithographySarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos; Argitis, P.; Gogolides, E.
2000Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithographyCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Gogolides, E.; Argitis, P.
1999Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithographyCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Argitis, P.; Gogolides, E.
1998Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resistCefalas, Alciviadis Constantinos; Argitis, P.; Kollia, Zoe; Sarantopoulou, Evangelia; Ford, T. W.; Stead, A. D.; Marranca, A.; Danson, C. N.; Knott, J.; Neely, D.
1998Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresistsArgitis, P.; Vasilopoulou, M. A.; Gogolides, E.; Tegou, E.; Hatzakis, M.; Kollia, Zoe; Cefalas, Alciviadis Constantinos
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