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DateTitleAuthor(s)Full text
2002Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithographyBellas, V.; Tegou, E.; Raptis, I.; Gogolides, E.; Argitis, P.; Iatrou, H.; Hadjichristidis, N.; Sarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos
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