Αποτελέσματα 1 έως 7 από 7
| Τύπος | Ημερομηνία | Τίτλος | Δημιουργός | Πλήρες κείμενο |
| 1998 | Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists | Argitis, P.; Vasilopoulou, M. A.; Gogolides, E.; Tegou, E.; Hatzakis, M.; Kollia, Zoe; Cefalas, Alciviadis Constantinos | |
| 1999 | Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithography | Cefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Argitis, P.; Gogolides, E. | |
| 2000 | Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography | Cefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Gogolides, E.; Argitis, P. | |
| 2001 | Photoresist materials for 157-nm photolithography | Sarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos; Argitis, P.; Gogolides, E. | |
| 2002 | He-2 60-90 nm photon source for investigating photodissociation dynamics of potential X-UV resists | Cefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Argitis, P.; Gogolides, E. | |
| 2002 | Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography | Bellas, V.; Tegou, E.; Raptis, I.; Gogolides, E.; Argitis, P.; Iatrou, H.; Hadjichristidis, N.; Sarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos | |
| 2003 | The challenges of 157 nm nanolithography: surface morphology of silicon-based copolymers | Sarantopoulou, Evangelia; Kollia, Zoe; Kocevar, K.; Musevic, I.; Kobe, S.; Drazic, G.; Gogolides, E.; Argitis, P.; Cefalas, Alciviadis Constantinos | |
