Browse Helios by "Author"
Jump to a point in the index:
Or type in a year:
Sort by: In order: Results/Page
Showing results 1 to 7 of 7

DateTitleAuthor(s)Full text
2003The challenges of 157 nm nanolithography: surface morphology of silicon-based copolymersSarantopoulou, Evangelia; Kollia, Zoe; Kocevar, K.; Musevic, I.; Kobe, S.; Drazic, G.; Gogolides, E.; Argitis, P.; Cefalas, Alciviadis Constantinos
2002He-2 60-90 nm photon source for investigating photodissociation dynamics of potential X-UV resistsCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Argitis, P.; Gogolides, E.
2002Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithographyBellas, V.; Tegou, E.; Raptis, I.; Gogolides, E.; Argitis, P.; Iatrou, H.; Hadjichristidis, N.; Sarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos
2001Photoresist materials for 157-nm photolithographySarantopoulou, Evangelia; Cefalas, Alciviadis Constantinos; Argitis, P.; Gogolides, E.
2000Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithographyCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Gogolides, E.; Argitis, P.
1999Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithographyCefalas, Alciviadis Constantinos; Sarantopoulou, Evangelia; Argitis, P.; Gogolides, E.
1998Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresistsArgitis, P.; Vasilopoulou, M. A.; Gogolides, E.; Tegou, E.; Hatzakis, M.; Kollia, Zoe; Cefalas, Alciviadis Constantinos
Showing results 1 to 7 of 7


Follow EKT at: