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DateTitleAuthor(s)Full text
1998Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresistsArgitis, P.; Vasilopoulou, M. A.; Gogolides, E.; Tegou, E.; Hatzakis, M.; Kollia, Zoe; Cefalas, Alciviadis Constantinos
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