@article{Argitis_Vasilopoulou_Gogolides_Tegou_Hatzakis_Kollia_Cefalas_1998, title={Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists}, volume={42}, ISSN={0167-9317}, archiveLocation={Ινστιτούτο Θεωρητικής και Φυσικής Χημείας (ΙΘΦΧ) - Επιστημονικό έργο}, url={https://hdl.handle.net/10442/6382}, DOI={10.1016/s0167-9317(98)00082-3}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Argitis, P. and Vasilopoulou, M. A. and Gogolides, E. and Tegou, E. and Hatzakis, M. and Kollia, Zoe and Cefalas, Alciviadis Constantinos}, year={1998}, pages={355–358} }