@article{Bellas_Tegou_Raptis_Gogolides_Argitis_Iatrou_Hadjichristidis_Sarantopoulou_Cefalas_2002, title={Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography}, volume={20}, ISSN={1071-1023}, archiveLocation={Ινστιτούτο Θεωρητικής και Φυσικής Χημείας (ΙΘΦΧ) - Επιστημονικό έργο}, url={https://hdl.handle.net/10442/6539}, DOI={10.1116/1.1526358}, number={6}, journal={Journal of Vacuum Science & Technology B}, publisher={American Institute of Physics}, author={Bellas, V. and Tegou, E. and Raptis, I. and Gogolides, E. and Argitis, P. and Iatrou, H. and Hadjichristidis, N. and Sarantopoulou, Evangelia and Cefalas, Alciviadis Constantinos}, year={2002}, pages={2902–2908} }