%0 Journal Article %A Bellas, V.%A %A Tegou, E.%A %A Raptis, I.%A %A Gogolides, E.%A %A Argitis, P.%A %A Iatrou, H.%A %A Hadjichristidis, N.%A %A Sarantopoulou, Evangelia%A %A Cefalas, Alciviadis Constantinos %D 2002 %T Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography %J Journal of Vacuum Science & Technology B %V 20 %@ 1071-1023 %R 10.1116/1.1526358 %I American Institute of Physics %P 2902–2908 %N 6 %U https://hdl.handle.net/10442/6539 %> Αποθετήριο Ήλιος / ΕΙΕ