Εξειδίκευση τύπου :	Άρθρο σε επιστημονικό περιοδικό
Τίτλος:	Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition
Δημιουργός/Συγγραφέας:	Fasaki, I. Koutoulaki, A. [EL] Κομπίτσας, Μιχάλης[EN] Kompitsas, Michael G. Charitidis, C.
Εκδότης:	Elsevier BV, North-Holland
Τόπος έκδοσης:	AMSTERDAM
Ημερομηνία:	2010-11-01
Γλώσσα:	Αγγλικά
ISSN:	0169-4332
DOI:	10.1016/j.apsusc.2010.07.006
Περίληψη:	Nickel oxide (NiO) thin films were prepared by reactive pulsed laser deposition on thermally oxidized Si substrates in 10 Pa oxygen pressure. The substrate temperature during deposition was varied and its influence on the structural, electrical and nanomechanical properties was studied. It was proved that the structural properties were affected by the increase of substrate temperature improving the crystalline structure. Furthermore, a higher substrate temperature resulted in a thicker NiO film, which was attributed to an increased grain size. This effect influenced the electrical properties, too. Resistivity measurements showed that it increased with the increase of substrate temperature. For the first time, the nanomechanical properties of NiO films were studied. The formation and improvement of crystalline structure affected the nanomechanical properties. Nanoindentation testing of NiO thin films revealed an increase of hardness (H) and elastic modulus (E) and a decrease of surface roughness when increasing the substrate temperature.
Τίτλος πηγής δημοσίευσης:	Applied Surface Science (formerly Known as Applications of Surface Science)
Τόμος/Κεφάλαιο:	257
Τεύχος:	2
Σελίδες:	429-433
Θεματική Κατηγορία:	[EL] Χημεία (Γενικά)[EN] Chemistry (General) [EL] Επιστήμη (Γενικά)[EN] Science (General) [EL] Τεχνολογία (Γενικά)[EN] Technology (General) [EL] Φυσική[EN] Physics
Λέξεις-Κλειδιά:	PLD Thin film deposition Nickel oxide Structural Electrical Mechanical properties Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter
Αξιολόγηση από ομότιμους (peer reviewed):	Ναι
Κάτοχος πνευματικών δικαιωμάτων:	© 2010 Elsevier B.V. All rights reserved.
Ηλεκτρονική διεύθυνση περιοδικού (link) :	http://www.elsevier.com/locate/apsusc
Εμφανίζεται στις συλλογές:	Ινστιτούτο Θεωρητικής και Φυσικής Χημείας (ΙΘΦΧ) - Επιστημονικό έργο